Description
Applications of CF4 Gas
- Carbon Tetrafluoromethane (CF4) is sometimes used as a low-temperature refrigerant. It can be used alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride;
- It also has uses in neutron detectors;
- As a cryogenic liquid suitable for applications requiring extremely cold temperatures.
- In the medical and healthcare research industry, cryogenic liquids help preserve genetic material and are used in lasers to destroy cancerous tissue during surgery.
- Liquid CF4 is used to preserve genetic material
- Due to its extremely high chemical stability, CF4 gas can also be used in the metal smelting and plastics industries.
- CF4 is also widely used in the fields of surface cleaning of electronic devices or printed circuit boards, solar cell production, laser technology, insulating gas, refrigeration, leak testing, aerospace missile control, and cleaning agents in printed circuit board production in industry.
- CF4 is also used to clean semiconductor chambers, etc.
Technical Specifications of CF4 Gas Supplied by MIG
Cylinder Sizes
- 10 liters; 40 liters
- Pressure: 100 bar;
CF4- 99.2%
- Tetrafluoromethane: 99.2%
- Nitrogen + Oxygen: 0.7%
- Hexafluoroethane + Carbon Dioxide: 0.1%
- Water content by volume: <1 ppm
- Acidity: <0.1 ppm
CF4 High Purity 99.99%
- Tetrafluoromethane: > 99.99%
- Oxygen: <5 ppm
- Nitrogen: <10 ppm
- Carbon Dioxide + Carbon Monoxide: <2 ppm
- Other Halocarbons: <2 ppm
- Sulfur Hexafluoride: <1 ppm
- Moisture: <2 ppm
- Acidity (as Hydrogen Fluoride): <0.1 ppm
CF4 High Purity 99.999%
- Tetrafluoromethane: > 99.999%
- Oxygen + Argon: <1 ppm
- Nitrogen: <4 ppm
- Carbon Dioxide + Carbon Monoxide: <1 ppm
- Other Halocarbons: <2 ppm
- Sulfur Hexafluoride: <1 ppm
- Moisture: <1 ppm
- Acidity (as Hydrogen Fluoride): <0.1 ppm
